Effect of pulse laser frequency on PLD growth of LuFeO3 explained by kinetic simulations of in-situ diffracted intensities

Effect of pulse laser frequency on PLD growth of LuFeO3 explained by kinetic simulations of in-situ diffracted intensities

Abstract Atomistic processes during pulsed-laser deposition (PLD) growth influence the physical properties of the resulting films. We investigated the PLD of epitaxial layers of hexagonal LuFeO $$_3$$ 3 by measuring the X-ray diffraction intensity in the quasiforbidden reflection 0003 in situ during...

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Bibliographic Details
Main Authors: Vít Gabriel, Pavel Kocán, Sondes Bauer, Berkin Nergis, Adriana Rodrigues, Lukáš Horák, Xiaowei Jin, Reinhard Schneider, Tilo Baumbach, Václav Holý
Format: Article
Language:English
Published: Nature Portfolio 2022-04-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-022-09414-3

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https://doi.org/10.1038/s41598-022-09414-3

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