Wafer defect recognition method based on multi-scale feature fusion

Wafer defect recognition is an important process of chip manufacturing. As different process flows can lead to different defect types, the correct identification of defect patterns is important for recognizing manufacturing problems and fixing them in good time. To achieve high precision identificat...

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Bibliographic Details
Main Authors: Yu Chen, Meng Zhao, Zhenyu Xu, Kaiyue Li, Jing Ji
Format: Article
Language:English
Published: Frontiers Media S.A. 2023-06-01
Series:Frontiers in Neuroscience
Subjects:
Online Access:https://www.frontiersin.org/articles/10.3389/fnins.2023.1202985/full