Machine Learning based Optical Proximity Correction Techniques

Machine Learning based Optical Proximity Correction Techniques

The shrinking of the size of the advanced technological nodes brings up new challenges to the semiconductor manufacturing community. The optical proximity correction (OPC) is invented to reduce the errors of the lithographic process. The conventional OPC techniques rely on the empirical models and o...

Full description

Bibliographic Details
Main Authors: Pengpeng Yuan, Taian Fan, Yaobin Feng, Peng Xu, Yayi Wei
Format: Article
Language:English
Published: JommPublish 2020-12-01
Series:Journal of Microelectronic Manufacturing
Subjects:
optical proximity correction
machine learning
deep learning; lithography
Online Access:http://www.jommpublish.org/p/67/

Internet

http://www.jommpublish.org/p/67/

Similar Items