Fenton Reaction for Enhancing Polishing Rate and Protonated Amine Functional Group Polymer for Inhibiting Corrosion in Ge<sub>1</sub>Sb<sub>4</sub>Te<sub>5</sub> Film Surface Chemical-Mechanical-Planarization

Fenton Reaction for Enhancing Polishing Rate and Protonated Amine Functional Group Polymer for Inhibiting Corrosion in Ge<sub>1</sub>Sb<sub>4</sub>Te<sub>5</sub> Film Surface Chemical-Mechanical-Planarization

A Fenton reaction and a corrosion inhibition strategy were designed for enhancing the polishing rate and achieving a corrosion-free Ge<sub>1</sub>Sb<sub>4</sub>Te<sub>5</sub> film surface during chemical-mechanical planarization (CMP) of three-dimensional (3D) cro...

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Bibliographic Details
Main Authors: Gi-Ppeum Jeong, Young-Hye Son, Jun-Seong Park, Pil-Su Kim, Man-Hyup Han, Seong-Wan Hong, Jin-Hyung Park, Hao Cui, Bo-Un Yoon, Jea-Gun Park
Format: Article
Language:English
Published: MDPI AG 2021-11-01
Series:Applied Sciences
Subjects:
chemical-mechanical planarization
phase-change random-access memory
Fenton reaction
ferric–ionic catalyst
corrosion inhibitor
chalcogenide
Online Access:https://www.mdpi.com/2076-3417/11/22/10872

Internet

https://www.mdpi.com/2076-3417/11/22/10872

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