On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF<sub>4</sub>, CHF<sub>3</sub>, and C<sub>4</sub>F<sub>8</sub> Gases Mixed with Oxygen

In this work, we discuss the effects of component ratios on plasma characteristics, chemistry of active species, and silicon etching kinetics in CF<sub>4</sub> + O<sub>2</sub>, CHF<sub>3</sub> + O<sub>2</sub>, and C<sub>4</sub>F<sub>8...

Full description

Bibliographic Details
Main Authors: Seung Yong Baek, Alexander Efremov, Alexander Bobylev, Gilyoung Choi, Kwang-Ho Kwon
Format: Article
Language:English
Published: MDPI AG 2023-07-01
Series:Materials
Subjects:
Online Access:https://www.mdpi.com/1996-1944/16/14/5043