On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF<sub>4</sub>, CHF<sub>3</sub>, and C<sub>4</sub>F<sub>8</sub> Gases Mixed with Oxygen
In this work, we discuss the effects of component ratios on plasma characteristics, chemistry of active species, and silicon etching kinetics in CF<sub>4</sub> + O<sub>2</sub>, CHF<sub>3</sub> + O<sub>2</sub>, and C<sub>4</sub>F<sub>8...
Main Authors: | , , , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2023-07-01
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Series: | Materials |
Subjects: | |
Online Access: | https://www.mdpi.com/1996-1944/16/14/5043 |