On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF<sub>4</sub>, CHF<sub>3</sub>, and C<sub>4</sub>F<sub>8</sub> Gases Mixed with Oxygen

On Relationships between Plasma Chemistry and Surface Reaction Kinetics Providing the Etching of Silicon in CF<sub>4</sub>, CHF<sub>3</sub>, and C<sub>4</sub>F<sub>8</sub> Gases Mixed with Oxygen

In this work, we discuss the effects of component ratios on plasma characteristics, chemistry of active species, and silicon etching kinetics in CF<sub>4</sub> + O<sub>2</sub>, CHF<sub>3</sub> + O<sub>2</sub>, and C<sub>4</sub>F<sub>8...

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Bibliographic Details
Main Authors:	Seung Yong Baek, Alexander Efremov, Alexander Bobylev, Gilyoung Choi, Kwang-Ho Kwon
Format:	Article
Language:	English
Published:	MDPI AG 2023-07-01
Series:	Materials
Subjects:	fluorocarbon gases active species ionization dissociation etching
Online Access:	https://www.mdpi.com/1996-1944/16/14/5043

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