Artificial Neural Network for Diffraction Based Overlay Measurement

Artificial Neural Network for Diffraction Based Overlay Measurement

Diffraction-based overlay (DBO) accuracy is critical to the intelligent nanolithography process control for producing advanced semiconductor fabrication nodes. Optical gratings located on various layers are commonly used as the targets for the detection of the overlay displacement offset in DBO meas...

Full description

Bibliographic Details
Main Authors: Hung-Fei Kuo, Anifatul Faricha
Format: Article
Language:English
Published: IEEE 2016-01-01
Series:IEEE Access
Subjects:
Artificial neural network (ANN)
diffraction based overlay (DBO)
nanolithography
optical scatterometry
sidewall angle (SWA)
Online Access:https://ieeexplore.ieee.org/document/7592879/

Internet

https://ieeexplore.ieee.org/document/7592879/

Similar Items