The role of pH solution in depositing MoO3 film by spray pyrolysis as hole selective contact on silicon-based heterojunction devices

The thermal evaporation technique has been frequently used for the deposition of sub-stoichiometric molybdenum oxide (MoO3) films. This approach requires a high temperature, which limits the control of MoO3 stoichiometry and affects its conducting mechanism. In this study, a spray pyrolysis techniqu...

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Bibliographic Details
Main Authors: Bashir Yusuf, Md Roslan Hashim, Mohd Mahadi Halim
Format: Article
Language:English
Published: Elsevier 2023-02-01
Series:Results in Physics
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2211379723000220