Post-annealing in ultra-high vacuum or nitrogen plasma for MoS2 thin films deposited by magnetron sputtering
The thin films of amorphous molybdenum disulfide were deposited at room temperature by magnetron sputtering technique. Post-annealing process in ultra-high vacuum (∼10−8 Pa) or nitrogen plasma environments at the temperatures of 300, 400, 500, and 700 °C have been first proposed to enhance the micro...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2024-03-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/6.0003229 |