Self-aligned formation of superconducting sub-5 nm PtSi films

Self-aligned formation of superconducting sub-5 nm PtSi films

Platinum silicide (PtSi) presents a promising superconductor for achieving silicon-based Josephson field-effect transistors (JoFETs). In a viable process flow to realize self-aligned PtSi formation, thermal oxidation at 600 °C is required to form a protective oxide layer on the surface of the as-for...

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Bibliographic Details
Main Authors: Yao Yao, Daniel F. Fernandes, Tereza Košutová, Tomas Kubart, Zhen Zhang, François Lefloch, Frédéric Gustavo, Axel Leblanc, János L. Lábár, Béla Pécz, Shi-Li Zhang
Format: Article
Language:English
Published: AIP Publishing LLC 2024-06-01
Series:APL Quantum
Online Access:http://dx.doi.org/10.1063/5.0205444

Internet

http://dx.doi.org/10.1063/5.0205444

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