Coherently strained and dislocation‐free architectured AlGaN/GaN submicron‐sized structures
Abstract To improve the performance and efficiency of Al containing III‐Nitride‐based devices, a number of issues must be addressed, especially the presence and generation of dislocations and other structural defects. The main sources of the dislocations are growth on non‐native substrates and heter...
Main Authors: | , , , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
Wiley-VCH
2022-02-01
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Series: | Nano Select |
Subjects: | |
Online Access: | https://doi.org/10.1002/nano.202100154 |