Construction and Characterization of TiN/Si<sub>3</sub>N<sub>4</sub> Composite Insulation Layer in TiN/Si<sub>3</sub>N<sub>4</sub>/Ni<sub>80</sub>Cr<sub>20</sub> Thin Film Cutting Force Sensor

Construction and Characterization of TiN/Si<sub>3</sub>N<sub>4</sub> Composite Insulation Layer in TiN/Si<sub>3</sub>N<sub>4</sub>/Ni<sub>80</sub>Cr<sub>20</sub> Thin Film Cutting Force Sensor

The measurement of cutting force is an effective method for machining condition monitoring in intelligent manufacturing. Titanium nitride films and silicon nitride films were prepared on 304 stainless steel substrates by DC-reactive magnetron sputtering and plasma-enhanced chemical vapor deposition...

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Bibliographic Details
Main Authors: Ruyuan Ma, Wenge Wu, Zhenyu He, Yunping Cheng, Lijuan Liu, Yongjuan Zhao
Format: Article
Language:English
Published: MDPI AG 2021-11-01
Series:Micromachines
Subjects:
TiN/Si<sub>3</sub>N<sub>4</sub> film
surface microstructure
phase composition
peak intensity
film thickness
mechanical properties
Online Access:https://www.mdpi.com/2072-666X/12/12/1476

Internet

https://www.mdpi.com/2072-666X/12/12/1476

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