Super-resolution fluorescence microscopy on E-beam resist film during electron beam exposure for mask patterning process
The fabrication of highly qualified patterns for photomasks using an electron beam writer is one of the key methods to achieve the requirements for high-end semiconductor devices manufacturing. We demonstrate in-situ examination of morphology changes in the electron-beam resist using super-resolutio...
| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2023-06-01
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| Series: | Micro and Nano Engineering |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007223000102 |