Super-resolution fluorescence microscopy on E-beam resist film during electron beam exposure for mask patterning process

The fabrication of highly qualified patterns for photomasks using an electron beam writer is one of the key methods to achieve the requirements for high-end semiconductor devices manufacturing. We demonstrate in-situ examination of morphology changes in the electron-beam resist using super-resolutio...

Full description

Bibliographic Details
Main Authors: Sukjong Bae, Flip de Jong, Rik Nuyts, Rahul Sasikumar, Haifeng Yuan, Seongjune Min, Jin Choi, Sanghee Lee, Joonsoo Park, Johan Hofkens
Format: Article
Language:English
Published: Elsevier 2023-06-01
Series:Micro and Nano Engineering
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2590007223000102

Similar Items