Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass

Fused silica glass, known for its exceptional physical and chemical properties, is widely used across diverse industries. Cerium oxide (CeO2), a common polishing abrasive, is extensively employed in polishing fused silica surfaces. Studies have revealed that chemical reactions occur on fused silica...

Ausführliche Beschreibung

Bibliographische Detailangaben
Hauptverfasser: Xiaolong Ke, Wei Wu, Bo Zhong, Tianyi Wang, Song Yuan, Zhenzhong Wang, Daewook Kim, Jianchun Liu, Min Li, Jiang Guo, Chunjin Wang
Format: Artikel
Sprache:English
Veröffentlicht: Elsevier 2025-01-01
Schriftenreihe:Journal of Materials Research and Technology
Schlagworte:
Online Zugang:http://www.sciencedirect.com/science/article/pii/S223878542402859X