| Summary: | Quantum confinement effects tend to diminish gate control over the channel, further degrading the channel electrostatics of short channel Double-Gate (DG) Silicon-on-Insulator (SOI) MOSFETs. In this work, we first design an n-channel Junction-less (JL) DG MOSFET with a channel length (Lg) of 10 nm, where the source/drain doping, determined through Technology Computer-Aided Design (TCAD) simulations, enables better gate control for different channel thicknesses (tch) and oxide thicknesses (tox). The source/drain doping, thus determined, enables JL DG MOSFETs to overcome quantum confinement effects while also achieving key ITRS (International Technology Roadmap for Semiconductors) targets in terms of sub-threshold slope (S) and threshold voltage (Vth). We then introduce a heavily doped symmetric p-type silicon layer at the interface of the channel region with the top/bottom oxide such that the thickness and doping of the p-type layer enable tuning of the threshold voltage. In this partially JL DG MOSFET, by replacing the n-type doped silicon with n-type silicon–germanium (Si0.7Ge0.3) of lower doping, determined through TCAD simulations, we continue to demonstrate excellent channel electrostatics (ITRS targets) at short channel lengths (Lg = 10 nm) over a wide range of channel and oxide thicknesses while also showing enhanced strong inversion channel currents.
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