The spectrum of a 1-μm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range
We present a calibrated spectrum in the 5.5–265.5 nm range from a microdroplet-tin Nd:YAG-laser-produced plasma under conditions relevant for the production of extreme ultraviolet (EUV) light at 13.5 nm for nanolithography. The plasma emission spectrum obtained using a custom-built transmission grat...
Main Authors: | Z. Bouza, J. Byers, J. Scheers, R. Schupp, Y. Mostafa, L. Behnke, Z. Mazzotta, J. Sheil, W. Ubachs, R. Hoekstra, M. Bayraktar, O. O. Versolato |
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Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2021-12-01
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Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/5.0073839 |
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