Recent Progresses and Perspectives of UV Laser Annealing Technologies for Advanced CMOS Devices

The state-of-the-art CMOS technology has started to adopt three-dimensional (3D) integration approaches, enabling continuous chip density increment and performance improvement, while alleviating difficulties encountered in traditional planar scaling. This new device architecture, in addition to the...

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Bibliographic Details
Main Authors: Toshiyuki Tabata, Fabien Rozé, Louis Thuries, Sébastien Halty, Pierre-Edouard Raynal, Imen Karmous, Karim Huet
Format: Article
Language:English
Published: MDPI AG 2022-08-01
Series:Electronics
Subjects:
Online Access:https://www.mdpi.com/2079-9292/11/17/2636