The development of laser-produced plasma EUV light source

The development of laser-produced plasma EUV light source

Extreme ultraviolet lithography (EUVL) has been demonstrated to meet the industrial requirements of new-generation semiconductor fabrication. The development of high-power EUV sources is a long-term critical challenge to the implementation of EUVL in high-volume manufacturing (HVM), together with ot...

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Bibliographic Details
Main Authors: De-Kun Yang, Du Wang, Qiu-Shi Huang, Yi Song, Jian Wu, Wen-Xue Li, Zhan-Shan Wang, Xia-Hui Tang, Hong-Xing Xu, Sheng Liu, Cheng-Qun Gui
Format: Article
Language:English
Published: Elsevier 2022-09-01
Series:Chip
Subjects:
Extreme ultraviolet source
Laser-produced plasma
Sn target
Long lifetime collector
Online Access:http://www.sciencedirect.com/science/article/pii/S270947232200017X

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http://www.sciencedirect.com/science/article/pii/S270947232200017X

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