Role of hydrogen carrier gas on the growth of few layer hexagonal boron nitrides by metal-organic chemical vapor deposition

Few layer hexagonal boron nitride (h-BN) films were grown on 2-inch sapphire substrates by using metal-organic chemical vapor deposition (MOCVD) with two different carrier gases, hydrogen (H2) and nitrogen (N2). Structural, optical and electrical properties of...

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Bibliographic Details
Main Authors: Dong Yeong Kim, Nam Han, Hokyeong Jeong, Jaewon Kim, Sunyong Hwang, Jong Kyu Kim
Format: Article
Language:English
Published: AIP Publishing LLC 2017-04-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4982029