Femtosecond Laser Direct‐Write Plasmonic Nanolithography in Dielectrics
Plasmon‐based devices have founded numerous applications in photonics based on optically excited strong near‐field effect at nanoscale. So far, the large‐area fabrication of periodic plasmonic nanostructures is still challenging due to a small write‐field limitation of lithography‐based techniques,...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2022-09-01
|
| Series: | Small Science |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/smsc.202200038 |
| _version_ | 1818055586093203456 |
|---|---|
| author | Han Zhu Bo Wu Mingsheng Gao Feng Ren Wei Qin Saulius Juodkazis Feng Chen |
| author_facet | Han Zhu Bo Wu Mingsheng Gao Feng Ren Wei Qin Saulius Juodkazis Feng Chen |
| author_sort | Han Zhu |
| collection | DOAJ |
| description | Plasmon‐based devices have founded numerous applications in photonics based on optically excited strong near‐field effect at nanoscale. So far, the large‐area fabrication of periodic plasmonic nanostructures is still challenging due to a small write‐field limitation of lithography‐based techniques, especially for metallic substrates. A novel strategy is proposed to fabricate millimeter‐sized patterns of periodic plasmonic nanostructures inside dielectric materials (glass) through a femtosecond laser direct‐write plasmonic nanolithography approach. Noble metal nanoparticles are formed by the ion implantation in glass and reshaped into a nanowire‐like nanoparticles’ assembly by direct writing with femtosecond laser harnessing plasmonic interaction. As‐designed patterns at nanoscale are inscribed by this type of plasmonic lithography to form wires composed of nanoparticles. Examples for applications, the linear dichroism response, and structural color have been achieved by the plasmonic nanogratings buried inside glass (i.e., at subsurface regions). The work opens a new avenue to manipulate metallic nanoparticles in solids by direct plasmonic nanolithography and offers a reliable implementation of large‐area fabrication of plasmonic nanostructures for diverse range of photonic applications. |
| first_indexed | 2024-12-10T12:15:18Z |
| format | Article |
| id | doaj.art-c4303442a31b4627b5e02dbb0e57f2c9 |
| institution | Directory Open Access Journal |
| issn | 2688-4046 |
| language | English |
| last_indexed | 2024-12-10T12:15:18Z |
| publishDate | 2022-09-01 |
| publisher | Wiley-VCH |
| record_format | Article |
| series | Small Science |
| spelling | doaj.art-c4303442a31b4627b5e02dbb0e57f2c92022-12-22T01:49:15ZengWiley-VCHSmall Science2688-40462022-09-0129n/an/a10.1002/smsc.202200038Femtosecond Laser Direct‐Write Plasmonic Nanolithography in DielectricsHan Zhu0Bo Wu1Mingsheng Gao2Feng Ren3Wei Qin4Saulius Juodkazis5Feng Chen6School of Physics State Key Laboratory of Crystal Materials Shandong University Jinan 250100 ChinaSchool of Physics State Key Laboratory of Crystal Materials Shandong University Jinan 250100 ChinaSchool of Physics State Key Laboratory of Crystal Materials Shandong University Jinan 250100 ChinaDepartment of Physics Center for Ion Beam Application and Center for Electron Microscopy Wuhan University Wuhan 430072 ChinaSchool of Physics State Key Laboratory of Crystal Materials Shandong University Jinan 250100 ChinaOptical Sciences Centre Faculty of Science, Engineering and Technology Swinburne University of Technology Hawthorn VIC 3122 AustraliaSchool of Physics State Key Laboratory of Crystal Materials Shandong University Jinan 250100 ChinaPlasmon‐based devices have founded numerous applications in photonics based on optically excited strong near‐field effect at nanoscale. So far, the large‐area fabrication of periodic plasmonic nanostructures is still challenging due to a small write‐field limitation of lithography‐based techniques, especially for metallic substrates. A novel strategy is proposed to fabricate millimeter‐sized patterns of periodic plasmonic nanostructures inside dielectric materials (glass) through a femtosecond laser direct‐write plasmonic nanolithography approach. Noble metal nanoparticles are formed by the ion implantation in glass and reshaped into a nanowire‐like nanoparticles’ assembly by direct writing with femtosecond laser harnessing plasmonic interaction. As‐designed patterns at nanoscale are inscribed by this type of plasmonic lithography to form wires composed of nanoparticles. Examples for applications, the linear dichroism response, and structural color have been achieved by the plasmonic nanogratings buried inside glass (i.e., at subsurface regions). The work opens a new avenue to manipulate metallic nanoparticles in solids by direct plasmonic nanolithography and offers a reliable implementation of large‐area fabrication of plasmonic nanostructures for diverse range of photonic applications.https://doi.org/10.1002/smsc.202200038femtosecond laser direct-writeplasmonic nanolithographystructural colorsurface plasmon resonance |
| spellingShingle | Han Zhu Bo Wu Mingsheng Gao Feng Ren Wei Qin Saulius Juodkazis Feng Chen Femtosecond Laser Direct‐Write Plasmonic Nanolithography in Dielectrics Small Science femtosecond laser direct-write plasmonic nanolithography structural color surface plasmon resonance |
| title | Femtosecond Laser Direct‐Write Plasmonic Nanolithography in Dielectrics |
| title_full | Femtosecond Laser Direct‐Write Plasmonic Nanolithography in Dielectrics |
| title_fullStr | Femtosecond Laser Direct‐Write Plasmonic Nanolithography in Dielectrics |
| title_full_unstemmed | Femtosecond Laser Direct‐Write Plasmonic Nanolithography in Dielectrics |
| title_short | Femtosecond Laser Direct‐Write Plasmonic Nanolithography in Dielectrics |
| title_sort | femtosecond laser direct write plasmonic nanolithography in dielectrics |
| topic | femtosecond laser direct-write plasmonic nanolithography structural color surface plasmon resonance |
| url | https://doi.org/10.1002/smsc.202200038 |
| work_keys_str_mv | AT hanzhu femtosecondlaserdirectwriteplasmonicnanolithographyindielectrics AT bowu femtosecondlaserdirectwriteplasmonicnanolithographyindielectrics AT mingshenggao femtosecondlaserdirectwriteplasmonicnanolithographyindielectrics AT fengren femtosecondlaserdirectwriteplasmonicnanolithographyindielectrics AT weiqin femtosecondlaserdirectwriteplasmonicnanolithographyindielectrics AT sauliusjuodkazis femtosecondlaserdirectwriteplasmonicnanolithographyindielectrics AT fengchen femtosecondlaserdirectwriteplasmonicnanolithographyindielectrics |