Measurement and Simulation of Ultra-Low-Energy Ion–Solid Interaction Dynamics

Measurement and Simulation of Ultra-Low-Energy Ion–Solid Interaction Dynamics

Ion implantation is a key capability for the semiconductor industry. As devices shrink, novel materials enter the manufacturing line, and quantum technologies transition to being more mainstream. Traditional implantation methods fall short in terms of energy, ion species, and positional precision. H...

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Bibliographic Details
Main Authors: Michael Titze, Jonathan D. Poplawsky, Silvan Kretschmer, Arkady V. Krasheninnikov, Barney L. Doyle, Edward S. Bielejec, Gerhard Hobler, Alex Belianinov
Format: Article
Language:English
Published: MDPI AG 2023-09-01
Series:Micromachines
Subjects:
focused ion beam
ion implantation
ultra-low energy
Online Access:https://www.mdpi.com/2072-666X/14/10/1884

Internet

https://www.mdpi.com/2072-666X/14/10/1884

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