Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction
Coherent x-ray diffractive imaging is a powerful technique for determining strain on the nanometer scale. Here, it is used to image semiconducting GaAs1-yNy structures on a GaAs substrate and to measure strain, demonstrating its potential for studying highly strained interfaces in devices.
Main Authors: | , , , , , , , , |
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Format: | Article |
Language: | English |
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Nature Portfolio
2020-04-01
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Series: | Communications Materials |
Online Access: | https://doi.org/10.1038/s43246-020-0021-6 |
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author | Felisa Berenguer Giorgio Pettinari Marco Felici Nilanthy Balakrishnan Jesse N. Clark Sylvain Ravy Amalia Patané Antonio Polimeni Gianluca Ciatto |
author_facet | Felisa Berenguer Giorgio Pettinari Marco Felici Nilanthy Balakrishnan Jesse N. Clark Sylvain Ravy Amalia Patané Antonio Polimeni Gianluca Ciatto |
author_sort | Felisa Berenguer |
collection | DOAJ |
description | Coherent x-ray diffractive imaging is a powerful technique for determining strain on the nanometer scale. Here, it is used to image semiconducting GaAs1-yNy structures on a GaAs substrate and to measure strain, demonstrating its potential for studying highly strained interfaces in devices. |
first_indexed | 2024-12-14T08:18:48Z |
format | Article |
id | doaj.art-c552cf1d1c2e495d85ef0e75514ebf38 |
institution | Directory Open Access Journal |
issn | 2662-4443 |
language | English |
last_indexed | 2024-12-14T08:18:48Z |
publishDate | 2020-04-01 |
publisher | Nature Portfolio |
record_format | Article |
series | Communications Materials |
spelling | doaj.art-c552cf1d1c2e495d85ef0e75514ebf382022-12-21T23:09:52ZengNature PortfolioCommunications Materials2662-44432020-04-01111810.1038/s43246-020-0021-6Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffractionFelisa Berenguer0Giorgio Pettinari1Marco Felici2Nilanthy Balakrishnan3Jesse N. Clark4Sylvain Ravy5Amalia Patané6Antonio Polimeni7Gianluca Ciatto8Synchrotron SOLEIL, L’Orme des MerisiersCNR, Institute for Photonics and NanotechnologiesDepartment of Physics, Sapienza Università di RomaSchool of Physics and Astronomy, University of NottinghamStanford PULSE Institute, SLAC National Accelerator LaboratorySynchrotron SOLEIL, L’Orme des MerisiersSchool of Physics and Astronomy, University of NottinghamDepartment of Physics, Sapienza Università di RomaSynchrotron SOLEIL, L’Orme des MerisiersCoherent x-ray diffractive imaging is a powerful technique for determining strain on the nanometer scale. Here, it is used to image semiconducting GaAs1-yNy structures on a GaAs substrate and to measure strain, demonstrating its potential for studying highly strained interfaces in devices.https://doi.org/10.1038/s43246-020-0021-6 |
spellingShingle | Felisa Berenguer Giorgio Pettinari Marco Felici Nilanthy Balakrishnan Jesse N. Clark Sylvain Ravy Amalia Patané Antonio Polimeni Gianluca Ciatto Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction Communications Materials |
title | Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction |
title_full | Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction |
title_fullStr | Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction |
title_full_unstemmed | Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction |
title_short | Imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x-ray diffraction |
title_sort | imaging shape and strain in nanoscale engineered semiconductors for photonics by coherent x ray diffraction |
url | https://doi.org/10.1038/s43246-020-0021-6 |
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