Preparation of N-Si-P-GaSe Heterojunctions Based on an Amorphous GaSe Layer Without Impurities and Study of Their Electrical Properties

The electrical and photoelectric properties of anisotype n-Si−p-GaSe heterojunctions obtained as a result of the deposition of a GaSe thin layer on a cold n-Si single crystal substrate by the thermal evaporation method were studied. It was determined that the height of the potential barrier in therm...

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Main Authors: Rahim Salim Madatov, A.S. Alekperov, F.N. Nurmammadova, Narmin A. Ismayilova, Sakin H. Jabarov
Format: Article
Language:English
Published: V.N. Karazin Kharkiv National University Publishing 2024-03-01
Series:East European Journal of Physics
Subjects:
Online Access:https://periodicals.karazin.ua/eejp/article/view/22516
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author Rahim Salim Madatov
A.S. Alekperov
F.N. Nurmammadova
Narmin A. Ismayilova
Sakin H. Jabarov
author_facet Rahim Salim Madatov
A.S. Alekperov
F.N. Nurmammadova
Narmin A. Ismayilova
Sakin H. Jabarov
author_sort Rahim Salim Madatov
collection DOAJ
description The electrical and photoelectric properties of anisotype n-Si−p-GaSe heterojunctions obtained as a result of the deposition of a GaSe thin layer on a cold n-Si single crystal substrate by the thermal evaporation method were studied. It was determined that the height of the potential barrier in thermal annealing structures at T = 200 °C during t = 3 hours occurs due to the decrease in the density of states of local levels located near the Fermi level in the amorphous layer. The mechanism of photosensitivity in an isotype heterostructures was analyzed and it was found that the photosensitivity of the heterojunction increases as a result of a decrease in the surface density of state at the contact boundary of the components, by thermal means. The spectral distribution of the quantum efficiency in the n‑Si – p‑GaSe heterojunction was studied and their perspective was determined.
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spelling doaj.art-c5b986b0c1c9452793bab7c4aab63a602024-03-05T22:41:10ZengV.N. Karazin Kharkiv National University PublishingEast European Journal of Physics2312-43342312-45392024-03-01132232610.26565/2312-4334-2024-1-2922516Preparation of N-Si-P-GaSe Heterojunctions Based on an Amorphous GaSe Layer Without Impurities and Study of Their Electrical PropertiesRahim Salim Madatov0A.S. Alekperov1F.N. Nurmammadova2Narmin A. Ismayilova3Sakin H. Jabarov4Institute of Radiation Problems, Ministry of Science and Education Republic of Azerbaijan, Baku, AzerbaijanAzerbaijan State Pedagogical University, Baku, AzerbaijanBaku Engineering University, Khirdalan, AzerbaijanInstitute of Physics, Ministry of Science and Education Republic of Azerbaijan, Baku, Azerbaijan; Western Caspian University, Baku, AzerbaijanInstitute of Radiation Problems, Ministry of Science and Education Republic of Azerbaijan, Baku, AzerbaijanThe electrical and photoelectric properties of anisotype n-Si−p-GaSe heterojunctions obtained as a result of the deposition of a GaSe thin layer on a cold n-Si single crystal substrate by the thermal evaporation method were studied. It was determined that the height of the potential barrier in thermal annealing structures at T = 200 °C during t = 3 hours occurs due to the decrease in the density of states of local levels located near the Fermi level in the amorphous layer. The mechanism of photosensitivity in an isotype heterostructures was analyzed and it was found that the photosensitivity of the heterojunction increases as a result of a decrease in the surface density of state at the contact boundary of the components, by thermal means. The spectral distribution of the quantum efficiency in the n‑Si – p‑GaSe heterojunction was studied and their perspective was determined.https://periodicals.karazin.ua/eejp/article/view/22516gasethin filmheterojunctionelectrophysical properties
spellingShingle Rahim Salim Madatov
A.S. Alekperov
F.N. Nurmammadova
Narmin A. Ismayilova
Sakin H. Jabarov
Preparation of N-Si-P-GaSe Heterojunctions Based on an Amorphous GaSe Layer Without Impurities and Study of Their Electrical Properties
East European Journal of Physics
gase
thin film
heterojunction
electrophysical properties
title Preparation of N-Si-P-GaSe Heterojunctions Based on an Amorphous GaSe Layer Without Impurities and Study of Their Electrical Properties
title_full Preparation of N-Si-P-GaSe Heterojunctions Based on an Amorphous GaSe Layer Without Impurities and Study of Their Electrical Properties
title_fullStr Preparation of N-Si-P-GaSe Heterojunctions Based on an Amorphous GaSe Layer Without Impurities and Study of Their Electrical Properties
title_full_unstemmed Preparation of N-Si-P-GaSe Heterojunctions Based on an Amorphous GaSe Layer Without Impurities and Study of Their Electrical Properties
title_short Preparation of N-Si-P-GaSe Heterojunctions Based on an Amorphous GaSe Layer Without Impurities and Study of Their Electrical Properties
title_sort preparation of n si p gase heterojunctions based on an amorphous gase layer without impurities and study of their electrical properties
topic gase
thin film
heterojunction
electrophysical properties
url https://periodicals.karazin.ua/eejp/article/view/22516
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AT asalekperov preparationofnsipgaseheterojunctionsbasedonanamorphousgaselayerwithoutimpuritiesandstudyoftheirelectricalproperties
AT fnnurmammadova preparationofnsipgaseheterojunctionsbasedonanamorphousgaselayerwithoutimpuritiesandstudyoftheirelectricalproperties
AT narminaismayilova preparationofnsipgaseheterojunctionsbasedonanamorphousgaselayerwithoutimpuritiesandstudyoftheirelectricalproperties
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