Design and Analysis of a Long-Stroke and High-Precision Positioning System for Scanning Beam Interference Lithography
A macro–micro dual-drive positioning system was developed for Scanning Beam Interference Lithography (SBIL) which uses a dual-frequency laser interferometer as the position reference and exhibits the characteristics of long travel, heavy load, and high accuracy. The macro-motion system adopts a fric...
| Main Authors: | , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2023-12-01
|
| Series: | Electronics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-9292/12/24/4960 |