Modeling and Simulation of Nonvolatile Memory Based on Copper Sulfide

<p>The memory cells has become one of the computer basics electronic components, especially nonvolatile ion-dependent growth of filament or so called Conductive Bridge Random Access Memory (CBRAM) type. The memory cells in this work is focused on using copper sulfide as ionic compound Cu<su...

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Main Author: Khalid Khaleel Mohammad
Format: Article
Language:English
Published: Tikrit University 2016-10-01
Series:Tikrit Journal of Engineering Sciences
Subjects:
Online Access:http://www.tj-es.com/ojs/index.php/tjes/article/view/611
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author Khalid Khaleel Mohammad
author_facet Khalid Khaleel Mohammad
author_sort Khalid Khaleel Mohammad
collection DOAJ
description <p>The memory cells has become one of the computer basics electronic components, especially nonvolatile ion-dependent growth of filament or so called Conductive Bridge Random Access Memory (CBRAM) type. The memory cells in this work is focused on using copper sulfide as ionic compound Cu<sub>2</sub>S, the model proposed to identify the behavior of the cell in terms of voltage and current. The model cell is then simulated in order to extract the variables that affect the behavior of the cell and the factors which can be identify the optimal dimensions and specifications in terms of their small size and minimum power dissipation as possible at the same time. The simulation results show that the best thickness of the cell is about 20 nm with a radius equal to 10 nm, These dimensions of the cell has a resistance ratio of  high resistance state HRS to low resistance state LRS(Roff / Ron) which correspond to different logic is about  10<sup>14</sup> .</p>
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spelling doaj.art-c719bd93c7cc4a75bf6956e99173e9822023-09-02T12:41:13ZengTikrit UniversityTikrit Journal of Engineering Sciences1813-162X2312-75892016-10-01232103109317Modeling and Simulation of Nonvolatile Memory Based on Copper SulfideKhalid Khaleel Mohammad0Electrical Engineering Department, University of Mosul, Mosul<p>The memory cells has become one of the computer basics electronic components, especially nonvolatile ion-dependent growth of filament or so called Conductive Bridge Random Access Memory (CBRAM) type. The memory cells in this work is focused on using copper sulfide as ionic compound Cu<sub>2</sub>S, the model proposed to identify the behavior of the cell in terms of voltage and current. The model cell is then simulated in order to extract the variables that affect the behavior of the cell and the factors which can be identify the optimal dimensions and specifications in terms of their small size and minimum power dissipation as possible at the same time. The simulation results show that the best thickness of the cell is about 20 nm with a radius equal to 10 nm, These dimensions of the cell has a resistance ratio of  high resistance state HRS to low resistance state LRS(Roff / Ron) which correspond to different logic is about  10<sup>14</sup> .</p>http://www.tj-es.com/ojs/index.php/tjes/article/view/611Ionic Memory, Switching Memory, CBRAM
spellingShingle Khalid Khaleel Mohammad
Modeling and Simulation of Nonvolatile Memory Based on Copper Sulfide
Tikrit Journal of Engineering Sciences
Ionic Memory, Switching Memory, CBRAM
title Modeling and Simulation of Nonvolatile Memory Based on Copper Sulfide
title_full Modeling and Simulation of Nonvolatile Memory Based on Copper Sulfide
title_fullStr Modeling and Simulation of Nonvolatile Memory Based on Copper Sulfide
title_full_unstemmed Modeling and Simulation of Nonvolatile Memory Based on Copper Sulfide
title_short Modeling and Simulation of Nonvolatile Memory Based on Copper Sulfide
title_sort modeling and simulation of nonvolatile memory based on copper sulfide
topic Ionic Memory, Switching Memory, CBRAM
url http://www.tj-es.com/ojs/index.php/tjes/article/view/611
work_keys_str_mv AT khalidkhaleelmohammad modelingandsimulationofnonvolatilememorybasedoncoppersulfide