A collisional global sheath – Bulk model of argon plasma for semiconductor scale manufacturing
Plasma processes enhance the high-quality, semiconductor fabrication employed in large-scale industries. A crucial element in this process are the many gases that generate different reactive species at low temperatures. Capacitive plasma discharge radio frequency CCPs play a major role in semiconduc...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2023-03-01
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| Series: | Alexandria Engineering Journal |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S1110016822008195 |