Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers
We developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers, including on the irregular surface of protruding cantilever tips. The process includes a floating-layer technique to coat the cantilevers in an electron-beam resist. We demonstrate gate definition t...
| Egile Nagusiak: | , , , , |
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| Formatua: | Artikulua |
| Hizkuntza: | English |
| Argitaratua: |
AIP Publishing LLC
2023-03-01
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| Saila: | AIP Advances |
| Sarrera elektronikoa: | http://dx.doi.org/10.1063/5.0127665 |
| Gaia: | We developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers, including on the irregular surface of protruding cantilever tips. The process includes a floating-layer technique to coat the cantilevers in an electron-beam resist. We demonstrate gate definition through a lift-off process and through an etching process. The cantilevers maintain a high force sensitivity after undergoing the patterning process. Our method allows the patterning of nanoscale devices on fragile scanning probes, extending their functionality as sensors. |
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| ISSN: | 2158-3226 |