Reducing leakage current in GaN-Schottky diodes by suppressing hollow core nanopipes

The nanopipes in GaN films grown on sapphire substrates using metal-organic chemical vapor deposition were identified as leakage-related defects through investigations by PeakForce tunneling atomic force microscopy. An insertion layer of n-Al0.03Ga0.97N can prevent nanopipes from extending, thereby...

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Main Authors: Qian Yang, Jing Yang, Haoran Long, Zongshun Liu, Lihong Duan, Degang Zhao
Format: Article
Language:English
Published: AIP Publishing LLC 2024-03-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0200855
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author Qian Yang
Jing Yang
Haoran Long
Zongshun Liu
Lihong Duan
Degang Zhao
author_facet Qian Yang
Jing Yang
Haoran Long
Zongshun Liu
Lihong Duan
Degang Zhao
author_sort Qian Yang
collection DOAJ
description The nanopipes in GaN films grown on sapphire substrates using metal-organic chemical vapor deposition were identified as leakage-related defects through investigations by PeakForce tunneling atomic force microscopy. An insertion layer of n-Al0.03Ga0.97N can prevent nanopipes from extending, thereby reducing the leakage current of Schottky diodes. By analyzing the element’s distribution in and out of nanopipes on epitaxial wafers, it is inferred that segregation of Ga around nanopipes may be responsible for the leakage.
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spelling doaj.art-c79e0497794b439e96255dcd2e7966642024-04-02T20:29:17ZengAIP Publishing LLCAIP Advances2158-32262024-03-01143035005035005-510.1063/5.0200855Reducing leakage current in GaN-Schottky diodes by suppressing hollow core nanopipesQian Yang0Jing Yang1Haoran Long2Zongshun Liu3Lihong Duan4Degang Zhao5State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaCollege of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaState Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, ChinaThe nanopipes in GaN films grown on sapphire substrates using metal-organic chemical vapor deposition were identified as leakage-related defects through investigations by PeakForce tunneling atomic force microscopy. An insertion layer of n-Al0.03Ga0.97N can prevent nanopipes from extending, thereby reducing the leakage current of Schottky diodes. By analyzing the element’s distribution in and out of nanopipes on epitaxial wafers, it is inferred that segregation of Ga around nanopipes may be responsible for the leakage.http://dx.doi.org/10.1063/5.0200855
spellingShingle Qian Yang
Jing Yang
Haoran Long
Zongshun Liu
Lihong Duan
Degang Zhao
Reducing leakage current in GaN-Schottky diodes by suppressing hollow core nanopipes
AIP Advances
title Reducing leakage current in GaN-Schottky diodes by suppressing hollow core nanopipes
title_full Reducing leakage current in GaN-Schottky diodes by suppressing hollow core nanopipes
title_fullStr Reducing leakage current in GaN-Schottky diodes by suppressing hollow core nanopipes
title_full_unstemmed Reducing leakage current in GaN-Schottky diodes by suppressing hollow core nanopipes
title_short Reducing leakage current in GaN-Schottky diodes by suppressing hollow core nanopipes
title_sort reducing leakage current in gan schottky diodes by suppressing hollow core nanopipes
url http://dx.doi.org/10.1063/5.0200855
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AT zongshunliu reducingleakagecurrentinganschottkydiodesbysuppressinghollowcorenanopipes
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