Study on the Mechanism of Solid-Phase Oxidant Action in Tribochemical Mechanical Polishing of SiC Single Crystal Substrate
Na<sub>2</sub>CO<sub>3</sub>—1.5 H<sub>2</sub>O<sub>2</sub>, KClO<sub>3</sub>, KMnO<sub>4</sub>, KIO<sub>3</sub>, and NaOH were selected for dry polishing tests with a 6H-SiC single crystal substrate on a polyurethan...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-12-01
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| Series: | Micromachines |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2072-666X/12/12/1547 |