Study on the Mechanism of Solid-Phase Oxidant Action in Tribochemical Mechanical Polishing of SiC Single Crystal Substrate
Na<sub>2</sub>CO<sub>3</sub>—1.5 H<sub>2</sub>O<sub>2</sub>, KClO<sub>3</sub>, KMnO<sub>4</sub>, KIO<sub>3</sub>, and NaOH were selected for dry polishing tests with a 6H-SiC single crystal substrate on a polyurethan...
Main Authors: | Wanting Qi, Xiaojun Cao, Wen Xiao, Zhankui Wang, Jianxiu Su |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2021-12-01
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Series: | Micromachines |
Subjects: | |
Online Access: | https://www.mdpi.com/2072-666X/12/12/1547 |
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