Rolling Nanoelectrode Lithography

Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pres...

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Bibliographic Details
Main Authors: Rashed Md. Murad Hasan, Xichun Luo, Jining Sun
Format: Article
Language:English
Published: MDPI AG 2020-06-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/11/7/656