Rolling Nanoelectrode Lithography
Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pres...
Main Authors: | Rashed Md. Murad Hasan, Xichun Luo, Jining Sun |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2020-06-01
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Series: | Micromachines |
Subjects: | |
Online Access: | https://www.mdpi.com/2072-666X/11/7/656 |
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