Bi-Distance Approach to Determine the Topological Invariants of Silicon Carbide
The use of silicon carbide is increasing significantly in the fields of research and technology. Topological indices enable data gathering on algebraic graphs and provide a mathematical framework for analyzing the chemical structural characteristics. In this paper, well-known degree-based...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | Arabic |
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College of Science for Women, University of Baghdad
2024-01-01
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| Series: | Baghdad Science Journal |
| Subjects: | |
| Online Access: | https://bsj.uobaghdad.edu.iq/index.php/BSJ/article/view/8178 |
| Summary: | The use of silicon carbide is increasing significantly in the fields of research and technology. Topological indices enable data gathering on algebraic graphs and provide a mathematical framework for analyzing the chemical structural characteristics. In this paper, well-known degree-based topological indices are used to analyze the chemical structures of silicon carbides. To evaluate the features of various chemical or non-chemical networks, a variety of topological indices are defined. In this paper, a new concept related to the degree of the graph called "bi-distance" is introduced, which is used to calculate all the additive as well as multiplicative degree-based indices for the isomer of silicon carbide, Si2C3-1[t, h]. The term "bi-distance" is derived from the concepts of degree and distance in such a way that second distance can be used to calculate degree-based topological indices.
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| ISSN: | 2078-8665 2411-7986 |