A statistical method to optimize the chemical etching process of zinc oxide thin films

A statistical method to optimize the chemical etching process of zinc oxide thin films

Zinc oxide (ZnO) is an attractive material for microscale and nanoscale devices. Its desirable semiconductor, piezoelectric and optical properties make it useful in applications ranging from microphones to missile warning systems to biometric sensors. This work introduces a demonstration of blending...

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Bibliographic Details
Main Authors: David D. Lynes, Hengky Chandrahalim, Justin M. Brown, Karanvir Singh, Kyle T. Bodily, Kevin D. Leedy
Format: Article
Language:English
Published: The Royal Society 2022-08-01
Series:Royal Society Open Science
Subjects:
etching process
chemical etching
thin film processing
controllable etching
statistically optimized etching
materials processing
Online Access:https://royalsocietypublishing.org/doi/10.1098/rsos.211560

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https://royalsocietypublishing.org/doi/10.1098/rsos.211560

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