High numerical aperture reflective deep ultraviolet Fourier ptychographic microscopy for nanofeature imaging

Pushing the resolution limit to the nanoscale is a critical challenge for applying the reflective Fourier ptychographic microscopy (FPM) to metrologies for characterization of nanoscale features. Characterization of opaque nanoscale samples using reflective FPM requires chiefly a light source with s...

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Bibliographic Details
Main Authors: Kwan Seob Park, Yoon Sung Bae, Sang-Soo Choi, Martin Y. Sohn
Format: Article
Language:English
Published: AIP Publishing LLC 2022-09-01
Series:APL Photonics
Online Access:http://dx.doi.org/10.1063/5.0102413