Magnetic bipolar transistor based on ZnO/NiO/Si heterostructure using pulsed laser deposition

Oxide semiconductors are promising candidates for next generation electronics. In this work, magnetic bipolar transistor was fabricated by growing thin films of p-NiO and n-ZnO on n-type silicon wafer by pulsed laser deposition technique with an in-situ annealing at 670° C in the presence of oxygen....

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Main Authors: Harsimrat Kaur, Monika Sharma, RamKrishna Ghosh, Satyabrata Mohapatra, Bijoy K. Kuanr
Format: Article
Language:English
Published: AIP Publishing LLC 2020-01-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.5130046
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author Harsimrat Kaur
Monika Sharma
RamKrishna Ghosh
Satyabrata Mohapatra
Bijoy K. Kuanr
author_facet Harsimrat Kaur
Monika Sharma
RamKrishna Ghosh
Satyabrata Mohapatra
Bijoy K. Kuanr
author_sort Harsimrat Kaur
collection DOAJ
description Oxide semiconductors are promising candidates for next generation electronics. In this work, magnetic bipolar transistor was fabricated by growing thin films of p-NiO and n-ZnO on n-type silicon wafer by pulsed laser deposition technique with an in-situ annealing at 670° C in the presence of oxygen. The structural characterization of these films was done by X-ray diffraction and Raman spectroscopy and magnetic properties were studied by vibrating sample magnetometer (VSM). I-V characteristic of fabricated transistor was tested in common emitter configuration with DC biasing. Junction parameters such as ideality factor, series resistance, and transistor parameters like q-point were determined by using conventional transistor output characteristics. The diode and transistor showed an increase in current with the externally applied magnetic field due to the presence of Nickel or Oxygen vacancies in NiO attributing to spin polarized bipolar transport. Therefore the current amplification in these devices can be controlled by spin; making it attractive for spintronic applications.
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spelling doaj.art-caa332d8c53e4672a84c7f003674e9962022-12-21T17:58:47ZengAIP Publishing LLCAIP Advances2158-32262020-01-01101015119015119-510.1063/1.5130046Magnetic bipolar transistor based on ZnO/NiO/Si heterostructure using pulsed laser depositionHarsimrat Kaur0Monika Sharma1RamKrishna Ghosh2Satyabrata Mohapatra3Bijoy K. Kuanr4GuruGobind Singh Indraprastha University, New Delhi 110078, IndiaSpecial Centre for Nanoscience, Jawaharlal Nehru University, New Delhi 110067, IndiaSpecial Centre for Nanoscience, Jawaharlal Nehru University, New Delhi 110067, IndiaGuruGobind Singh Indraprastha University, New Delhi 110078, IndiaSpecial Centre for Nanoscience, Jawaharlal Nehru University, New Delhi 110067, IndiaOxide semiconductors are promising candidates for next generation electronics. In this work, magnetic bipolar transistor was fabricated by growing thin films of p-NiO and n-ZnO on n-type silicon wafer by pulsed laser deposition technique with an in-situ annealing at 670° C in the presence of oxygen. The structural characterization of these films was done by X-ray diffraction and Raman spectroscopy and magnetic properties were studied by vibrating sample magnetometer (VSM). I-V characteristic of fabricated transistor was tested in common emitter configuration with DC biasing. Junction parameters such as ideality factor, series resistance, and transistor parameters like q-point were determined by using conventional transistor output characteristics. The diode and transistor showed an increase in current with the externally applied magnetic field due to the presence of Nickel or Oxygen vacancies in NiO attributing to spin polarized bipolar transport. Therefore the current amplification in these devices can be controlled by spin; making it attractive for spintronic applications.http://dx.doi.org/10.1063/1.5130046
spellingShingle Harsimrat Kaur
Monika Sharma
RamKrishna Ghosh
Satyabrata Mohapatra
Bijoy K. Kuanr
Magnetic bipolar transistor based on ZnO/NiO/Si heterostructure using pulsed laser deposition
AIP Advances
title Magnetic bipolar transistor based on ZnO/NiO/Si heterostructure using pulsed laser deposition
title_full Magnetic bipolar transistor based on ZnO/NiO/Si heterostructure using pulsed laser deposition
title_fullStr Magnetic bipolar transistor based on ZnO/NiO/Si heterostructure using pulsed laser deposition
title_full_unstemmed Magnetic bipolar transistor based on ZnO/NiO/Si heterostructure using pulsed laser deposition
title_short Magnetic bipolar transistor based on ZnO/NiO/Si heterostructure using pulsed laser deposition
title_sort magnetic bipolar transistor based on zno nio si heterostructure using pulsed laser deposition
url http://dx.doi.org/10.1063/1.5130046
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AT ramkrishnaghosh magneticbipolartransistorbasedonznoniosiheterostructureusingpulsedlaserdeposition
AT satyabratamohapatra magneticbipolartransistorbasedonznoniosiheterostructureusingpulsedlaserdeposition
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