Effect of Oxygen Flow Rate on Properties of Aluminum-Doped Indium-Saving Indium Tin Oxide (ITO) Thin Films Sputtered on Preheated Glass Substrates

Effect of Oxygen Flow Rate on Properties of Aluminum-Doped Indium-Saving Indium Tin Oxide (ITO) Thin Films Sputtered on Preheated Glass Substrates

Amorphous aluminum-doped indium tin oxide (ITO) thin films with a reduced indium oxide content of 50 mass% were manufactured by co-sputtering of ITO and Al<sub>2</sub>O<sub>3</sub> targets in a mixed argon–oxygen atmosphere onto glass substrates preheated at 523 K. The oxygen...

Full description

Bibliographic Details
Main Authors: Svitlana Petrovska, Ruslan Sergiienko, Bogdan Ilkiv, Takashi Nakamura, Makoto Ohtsuka
Format: Article
Language:English
Published: MDPI AG 2021-10-01
Series:Metals
Subjects:
aluminum-doped indium tin oxide
amorphous thin film
electrical property
optical property
direct current sputtering
radio frequency sputtering
Online Access:https://www.mdpi.com/2075-4701/11/10/1604

Internet

https://www.mdpi.com/2075-4701/11/10/1604

Similar Items