Fabrication of advanced thin film for high performance display by nanoimprinting process via gallium oxide solution doped tin
Line pattern replication process through nanoimprint lithography (NIL) method has been used in numerous of research fields. NIL technology is not yet utilized for displays industry, and we propose an alignment layer of the sol-gel process using NIL. One-dimensionally nanopatterned by polydimethylsil...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2024-05-01
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| Series: | Journal of Materials Research and Technology |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2238785424006628 |