Plasma treatment studies of MIS devices

Bibliografski detalji
Glavni autor:	Basa Deepak
Format:	Članak
Jezik:	English
Izdano:	De Gruyter 2010-06-01
Serija:	Open Physics
Teme:	silicon nitride plasma nitridation plasma oxidation interface state density elastic backscattering
Online pristup:	https://doi.org/10.2478/s11534-009-0095-8

Internet