Optimization of Lens Adjustment in Semiconductor Lithography Equipment Using Quadratically Constrained and Second-Order Cone Programming

Optimization of Lens Adjustment in Semiconductor Lithography Equipment Using Quadratically Constrained and Second-Order Cone Programming

The present paper considers optimization of lens adjustment in semiconductor lithography equipment. For improving productivity, the laser irradiation power of recent semiconductor lithography equipment has been boosted, which causes significant aberration due to heating during exposure. The aberrati...

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Bibliographic Details
Main Authors: Yuji SHINANO, Toshiyuki YOSHIHARA, Ryuhei MIYASHIRO, Youzou FUKAGAWA
Format: Article
Language:English
Published: The Japan Society of Mechanical Engineers 2010-08-01
Series:Journal of Advanced Mechanical Design, Systems, and Manufacturing
Subjects:
semiconductor lithography
aberration
optimum design
system engineering
optical instrument
precision instrument
second order cone programming
quadratically constrained programming
engineering optimization
Online Access:https://www.jstage.jst.go.jp/article/jamdsm/4/4/4_4_785/_pdf/-char/en

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https://www.jstage.jst.go.jp/article/jamdsm/4/4/4_4_785/_pdf/-char/en

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