FDTD-Based Study on Equivalent Medium Approximation Model of Surface Roughness for Thin Films Characterization Using Spectroscopic Ellipsometry
Spectroscopic ellipsometry (SE) is an effective method to measure the optical constants of thin film materials which is very sensitive to the surface topography of thin films. When performing ellipsometric measurements of the optical constants of solid materials with rough surfaces, the equivalent m...
Main Authors: | Wanpei Yu, Changcai Cui, Huihui Li, Subiao Bian, Xi Chen |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2022-08-01
|
Series: | Photonics |
Subjects: | |
Online Access: | https://www.mdpi.com/2304-6732/9/9/621 |
Similar Items
-
Characterization of amorphous carbon films from 5 nm to 200 nm on single-side polished a-plane sapphire substrates by spectroscopic ellipsometry
by: Ziqing Li, et al.
Published: (2022-10-01) -
Regime Map of the Effective Medium Approximation Modelling of Micro-Rough Surfaces in Ellipsometry
by: Meijiao Huang, et al.
Published: (2024-02-01) -
Spectroscopic ellipsometry for active nano- and meta-materials
by: Toudert Johann
Published: (2014-06-01) -
Spectroscopic imaging ellipsometry for thin film detection on uniaxial crystal
by: Guan, Lichao, et al.
Published: (2019) -
Deep Learning for Rapid Analysis of Spectroscopic Ellipsometry Data
by: Yifei Li, et al.
Published: (2021-12-01)