Large ferroelectric polarization and high dielectric constant in HfO2-based thin films via Hf0.5Zr0.5O2/ZrO2 nanobilayer engineering
HfO2-based ferroelectric films have been extensively explored and utilized in the field of non-volatile memory and electrical programmability. However, the trade-off between ferroelectric polarization and dielectric constant in HfO2 has limited the overall performance improvement of devices in pract...
Main Authors: | , , , , , |
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Format: | Article |
Language: | English |
Published: |
Elsevier
2025-05-01
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Series: | Journal of Materiomics |
Subjects: | |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2352847824001618 |