Three-beam convergent-beam electron diffraction for measuring crystallographic phases

Under almost all circumstances, electron diffraction patterns contain information about the phases of structure factors, a consequence of the short wavelength of an electron and its strong Coulombic interaction with matter. However, extracting this information remains a challenge and no generic meth...

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Main Authors: Yueming Guo, Philip N. H. Nakashima, Joanne Etheridge
Format: Article
Language:English
Published: International Union of Crystallography 2018-11-01
Series:IUCrJ
Subjects:
Online Access:http://scripts.iucr.org/cgi-bin/paper?S2052252518012216
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author Yueming Guo
Philip N. H. Nakashima
Joanne Etheridge
author_facet Yueming Guo
Philip N. H. Nakashima
Joanne Etheridge
author_sort Yueming Guo
collection DOAJ
description Under almost all circumstances, electron diffraction patterns contain information about the phases of structure factors, a consequence of the short wavelength of an electron and its strong Coulombic interaction with matter. However, extracting this information remains a challenge and no generic method exists. In this work, a set of simple analytical expressions is derived for the intensity distribution in convergent-beam electron diffraction (CBED) patterns recorded under three-beam conditions. It is shown that these expressions can be used to identify features in three-beam CBED patterns from which three-phase invariants can be extracted directly, without any iterative refinement processes. The octant, in which the three-phase invariant lies, can be determined simply by inspection of the indexed CBED patterns (i.e. the uncertainty of the phase measurement is ±22.5°). This approach is demonstrated with the experimental measurement of three-phase invariants in two simple test cases: centrosymmetric Si and non-centrosymmetric GaAs. This method may complement existing structure determination methods by providing direct measurements of three-phase invariants to replace `guessed' invariants in ab initio phasing methods and hence provide more stringent constraints to the structure solution.
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spelling doaj.art-ce52218a92a742a181fc63f497a07d832022-12-21T19:42:27ZengInternational Union of CrystallographyIUCrJ2052-25252018-11-015675376410.1107/S2052252518012216gq5009Three-beam convergent-beam electron diffraction for measuring crystallographic phasesYueming Guo0Philip N. H. Nakashima1Joanne Etheridge2Department of Materials Science and Engineering, Monash University, Victoria 3800, AustraliaDepartment of Materials Science and Engineering, Monash University, Victoria 3800, AustraliaDepartment of Materials Science and Engineering, Monash University, Victoria 3800, AustraliaUnder almost all circumstances, electron diffraction patterns contain information about the phases of structure factors, a consequence of the short wavelength of an electron and its strong Coulombic interaction with matter. However, extracting this information remains a challenge and no generic method exists. In this work, a set of simple analytical expressions is derived for the intensity distribution in convergent-beam electron diffraction (CBED) patterns recorded under three-beam conditions. It is shown that these expressions can be used to identify features in three-beam CBED patterns from which three-phase invariants can be extracted directly, without any iterative refinement processes. The octant, in which the three-phase invariant lies, can be determined simply by inspection of the indexed CBED patterns (i.e. the uncertainty of the phase measurement is ±22.5°). This approach is demonstrated with the experimental measurement of three-phase invariants in two simple test cases: centrosymmetric Si and non-centrosymmetric GaAs. This method may complement existing structure determination methods by providing direct measurements of three-phase invariants to replace `guessed' invariants in ab initio phasing methods and hence provide more stringent constraints to the structure solution.http://scripts.iucr.org/cgi-bin/paper?S2052252518012216crystallographic phase problemthree-phase invariantsconvergent-beam electron diffractionstructure determinationenantiomorph ambiguitynanocrystalsdynamical studiesmultiple scattering
spellingShingle Yueming Guo
Philip N. H. Nakashima
Joanne Etheridge
Three-beam convergent-beam electron diffraction for measuring crystallographic phases
IUCrJ
crystallographic phase problem
three-phase invariants
convergent-beam electron diffraction
structure determination
enantiomorph ambiguity
nanocrystals
dynamical studies
multiple scattering
title Three-beam convergent-beam electron diffraction for measuring crystallographic phases
title_full Three-beam convergent-beam electron diffraction for measuring crystallographic phases
title_fullStr Three-beam convergent-beam electron diffraction for measuring crystallographic phases
title_full_unstemmed Three-beam convergent-beam electron diffraction for measuring crystallographic phases
title_short Three-beam convergent-beam electron diffraction for measuring crystallographic phases
title_sort three beam convergent beam electron diffraction for measuring crystallographic phases
topic crystallographic phase problem
three-phase invariants
convergent-beam electron diffraction
structure determination
enantiomorph ambiguity
nanocrystals
dynamical studies
multiple scattering
url http://scripts.iucr.org/cgi-bin/paper?S2052252518012216
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