Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors

For the best possible limit of detection of any thin film-based magnetic field sensor, the functional magnetic film properties are an essential parameter. For sensors based on magnetostrictive layers, the chemical composition, morphology and intrinsic stresses of the layer have to be controlled duri...

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Main Authors: Lars Thormählen, Dennis Seidler, Viktor Schell, Frans Munnik, Jeffrey McCord, Dirk Meyners
Format: Article
Language:English
Published: MDPI AG 2021-12-01
Series:Sensors
Subjects:
Online Access:https://www.mdpi.com/1424-8220/21/24/8386
_version_ 1827669719761551360
author Lars Thormählen
Dennis Seidler
Viktor Schell
Frans Munnik
Jeffrey McCord
Dirk Meyners
author_facet Lars Thormählen
Dennis Seidler
Viktor Schell
Frans Munnik
Jeffrey McCord
Dirk Meyners
author_sort Lars Thormählen
collection DOAJ
description For the best possible limit of detection of any thin film-based magnetic field sensor, the functional magnetic film properties are an essential parameter. For sensors based on magnetostrictive layers, the chemical composition, morphology and intrinsic stresses of the layer have to be controlled during film deposition to further control magnetic influences such as crystallographic effects, pinning effects and stress anisotropies. For the application in magnetic surface acoustic wave sensors, the magnetostrictive layers are deposited on rotated piezoelectric single crystal substrates. The thermomechanical properties of quartz can lead to undesirable layer stresses and associated magnetic anisotropies if the temperature increases during deposition. With this in mind, we compare amorphous, magnetostrictive FeCoSiB films prepared by RF and DC magnetron sputter deposition. The chemical, structural and magnetic properties determined by elastic recoil detection, X-ray diffraction, and magneto-optical magnetometry and magnetic domain analysis are correlated with the resulting surface acoustic wave sensor properties such as phase noise level and limit of detection. To confirm the material properties, SAW sensors with magnetostrictive layers deposited with RF and DC deposition have been prepared and characterized, showing comparable detection limits below 200 pT/Hz<sup>1/2</sup> at 10 Hz. The main benefit of the DC deposition is achieving higher deposition rates while maintaining similar low substrate temperatures.
first_indexed 2024-03-10T03:09:05Z
format Article
id doaj.art-cf2d5842351f4ea8951e00865b519b0b
institution Directory Open Access Journal
issn 1424-8220
language English
last_indexed 2024-03-10T03:09:05Z
publishDate 2021-12-01
publisher MDPI AG
record_format Article
series Sensors
spelling doaj.art-cf2d5842351f4ea8951e00865b519b0b2023-11-23T10:30:45ZengMDPI AGSensors1424-82202021-12-012124838610.3390/s21248386Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field SensorsLars Thormählen0Dennis Seidler1Viktor Schell2Frans Munnik3Jeffrey McCord4Dirk Meyners5Institute for Materials Science, Kiel University, Kaiserstraße 2, 24143 Kiel, GermanyInstitute for Materials Science, Kiel University, Kaiserstraße 2, 24143 Kiel, GermanyInstitute for Materials Science, Kiel University, Kaiserstraße 2, 24143 Kiel, GermanyInstitute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf (HZDR), 01328 Dresden, GermanyInstitute for Materials Science, Kiel University, Kaiserstraße 2, 24143 Kiel, GermanyInstitute for Materials Science, Kiel University, Kaiserstraße 2, 24143 Kiel, GermanyFor the best possible limit of detection of any thin film-based magnetic field sensor, the functional magnetic film properties are an essential parameter. For sensors based on magnetostrictive layers, the chemical composition, morphology and intrinsic stresses of the layer have to be controlled during film deposition to further control magnetic influences such as crystallographic effects, pinning effects and stress anisotropies. For the application in magnetic surface acoustic wave sensors, the magnetostrictive layers are deposited on rotated piezoelectric single crystal substrates. The thermomechanical properties of quartz can lead to undesirable layer stresses and associated magnetic anisotropies if the temperature increases during deposition. With this in mind, we compare amorphous, magnetostrictive FeCoSiB films prepared by RF and DC magnetron sputter deposition. The chemical, structural and magnetic properties determined by elastic recoil detection, X-ray diffraction, and magneto-optical magnetometry and magnetic domain analysis are correlated with the resulting surface acoustic wave sensor properties such as phase noise level and limit of detection. To confirm the material properties, SAW sensors with magnetostrictive layers deposited with RF and DC deposition have been prepared and characterized, showing comparable detection limits below 200 pT/Hz<sup>1/2</sup> at 10 Hz. The main benefit of the DC deposition is achieving higher deposition rates while maintaining similar low substrate temperatures.https://www.mdpi.com/1424-8220/21/24/8386magnetron sputter depositionFeCoSiBERDAXRDfilm stressmagnetic field sensor
spellingShingle Lars Thormählen
Dennis Seidler
Viktor Schell
Frans Munnik
Jeffrey McCord
Dirk Meyners
Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors
Sensors
magnetron sputter deposition
FeCoSiB
ERDA
XRD
film stress
magnetic field sensor
title Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors
title_full Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors
title_fullStr Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors
title_full_unstemmed Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors
title_short Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors
title_sort sputter deposited magnetostrictive layers for saw magnetic field sensors
topic magnetron sputter deposition
FeCoSiB
ERDA
XRD
film stress
magnetic field sensor
url https://www.mdpi.com/1424-8220/21/24/8386
work_keys_str_mv AT larsthormahlen sputterdepositedmagnetostrictivelayersforsawmagneticfieldsensors
AT dennisseidler sputterdepositedmagnetostrictivelayersforsawmagneticfieldsensors
AT viktorschell sputterdepositedmagnetostrictivelayersforsawmagneticfieldsensors
AT fransmunnik sputterdepositedmagnetostrictivelayersforsawmagneticfieldsensors
AT jeffreymccord sputterdepositedmagnetostrictivelayersforsawmagneticfieldsensors
AT dirkmeyners sputterdepositedmagnetostrictivelayersforsawmagneticfieldsensors