Argon irradiation effects on the structural and optical properties of reactively sputtered CrN films
The present study deals with CrN films irradiated at room temperature (RT) with 200 keV Ar+ ions. The CrN layers were deposited by d.c. reactive sputtering on Si (100) wafers, at nitrogen partial pressure of 5×10-4 mbar, to a total thickness of 280 nm. The substrates were held at 150ºC duri...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
International Institute for the Science of Sintering, Beograd
2015-01-01
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| Series: | Science of Sintering |
| Subjects: | |
| Online Access: | http://www.doiserbia.nb.rs/img/doi/0350-820X/2015/0350-820X1502187N.pdf |