Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning Processes
In this study, a scatterometry-based monitoring system designed for tracking the quality and reproducibility of laser-textured surfaces in industrial environments was validated in off-line and real-time modes. To this end, a stainless steel plate was structured by direct laser interference patternin...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
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MDPI AG
2023-02-01
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| Series: | Optics |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2673-3269/4/1/14 |
| _version_ | 1797609667201859584 |
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| author | Marcos Soldera Sascha Teutoburg-Weiss Nikolai Schröder Bogdan Voisiat Andrés Fabián Lasagni |
| author_facet | Marcos Soldera Sascha Teutoburg-Weiss Nikolai Schröder Bogdan Voisiat Andrés Fabián Lasagni |
| author_sort | Marcos Soldera |
| collection | DOAJ |
| description | In this study, a scatterometry-based monitoring system designed for tracking the quality and reproducibility of laser-textured surfaces in industrial environments was validated in off-line and real-time modes. To this end, a stainless steel plate was structured by direct laser interference patterning (DLIP) following a set of conditions with artificial patterning errors. Namely, fluctuations of the DLIP process parameters such as laser fluence, spatial period, and focus position are introduced, and also, two patterning strategies are implemented, whereby pulses are deliberately not fired at both deterministic and random positions. The detection limits of the system were determined by recording the intensities of the zero, first, and second diffraction order using a charge-coupled device (CCD) camera. As supported by topographical measurements, the system can accurately calculate spatial periods with a resolution of at least 100 nm. In addition, focus shifts of 70 µm from the optimum focus position can be detected, and missing patterned lines with a minimum width of 28 µm can be identified. The validation of this compact characterization unit represents a step forward for its implementation as an in-line monitoring tool for industrial laser-based micropatterning. |
| first_indexed | 2024-03-11T06:04:36Z |
| format | Article |
| id | doaj.art-cfb8457d86cd4ce591765b3462344520 |
| institution | Directory Open Access Journal |
| issn | 2673-3269 |
| language | English |
| last_indexed | 2024-03-11T06:04:36Z |
| publishDate | 2023-02-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Optics |
| spelling | doaj.art-cfb8457d86cd4ce591765b34623445202023-11-17T13:07:46ZengMDPI AGOptics2673-32692023-02-014119821310.3390/opt4010014Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning ProcessesMarcos Soldera0Sascha Teutoburg-Weiss1Nikolai Schröder2Bogdan Voisiat3Andrés Fabián Lasagni4Institut für Fertigungstechnik, Technische Universität Dresden, George-Bähr-Str. 3c, 01069 Dresden, GermanyInstitut für Fertigungstechnik, Technische Universität Dresden, George-Bähr-Str. 3c, 01069 Dresden, GermanyInstitut für Fertigungstechnik, Technische Universität Dresden, George-Bähr-Str. 3c, 01069 Dresden, GermanyInstitut für Fertigungstechnik, Technische Universität Dresden, George-Bähr-Str. 3c, 01069 Dresden, GermanyInstitut für Fertigungstechnik, Technische Universität Dresden, George-Bähr-Str. 3c, 01069 Dresden, GermanyIn this study, a scatterometry-based monitoring system designed for tracking the quality and reproducibility of laser-textured surfaces in industrial environments was validated in off-line and real-time modes. To this end, a stainless steel plate was structured by direct laser interference patterning (DLIP) following a set of conditions with artificial patterning errors. Namely, fluctuations of the DLIP process parameters such as laser fluence, spatial period, and focus position are introduced, and also, two patterning strategies are implemented, whereby pulses are deliberately not fired at both deterministic and random positions. The detection limits of the system were determined by recording the intensities of the zero, first, and second diffraction order using a charge-coupled device (CCD) camera. As supported by topographical measurements, the system can accurately calculate spatial periods with a resolution of at least 100 nm. In addition, focus shifts of 70 µm from the optimum focus position can be detected, and missing patterned lines with a minimum width of 28 µm can be identified. The validation of this compact characterization unit represents a step forward for its implementation as an in-line monitoring tool for industrial laser-based micropatterning.https://www.mdpi.com/2673-3269/4/1/14laser texturingscatterometrydirect laser interference patterningin-line monitoringmicrofabricationdiffraction gratings |
| spellingShingle | Marcos Soldera Sascha Teutoburg-Weiss Nikolai Schröder Bogdan Voisiat Andrés Fabián Lasagni Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning Processes Optics laser texturing scatterometry direct laser interference patterning in-line monitoring microfabrication diffraction gratings |
| title | Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning Processes |
| title_full | Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning Processes |
| title_fullStr | Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning Processes |
| title_full_unstemmed | Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning Processes |
| title_short | Compact Optical System Based on Scatterometry for Off-Line and Real-Time Monitoring of Surface Micropatterning Processes |
| title_sort | compact optical system based on scatterometry for off line and real time monitoring of surface micropatterning processes |
| topic | laser texturing scatterometry direct laser interference patterning in-line monitoring microfabrication diffraction gratings |
| url | https://www.mdpi.com/2673-3269/4/1/14 |
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