The Impact of Plasma Intensity on the Unused Rate in Semiconductor Manufacturing: Comparative Analysis Across Intensity Ranges from 30 to 3000

The Impact of Plasma Intensity on the Unused Rate in Semiconductor Manufacturing: Comparative Analysis Across Intensity Ranges from 30 to 3000

This study examines the impact of plasma intensity on the process unused rate, expressed as 1-Ui, within semiconductor manufacturing. Since the influence of plasma level on 1-Ui is inconsistent without considering gas, the experimental data were analyzed after grouping plasma levels by intensity. Pl...

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Bibliographic Details
Main Authors: Dae Kee Min, Jiyun Woo, Jinwook Kim, Bong-Jae Lee, Eui-chan Jeon, Joohee Lee
Format: Article
Language:English
Published: MDPI AG 2025-01-01
Series:Applied Sciences
Subjects:
plasma intensity
semiconductor manufacturing
process unused rate
1-Ui
ANOVA
non-linear regression
Online Access:https://www.mdpi.com/2076-3417/15/3/1441

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https://www.mdpi.com/2076-3417/15/3/1441

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