Effect of Microwave Annealing on the Sensing Characteristics of HfO<sub>2</sub> Thin Film for High Sensitive pH-EGFET Sensor

Recently, certain challenges have persisted in PH sensor applications, especially when employing hafnium oxide (HfO<sub>2</sub>) thin films as sensing layers, where issues related to sensitivity, hysteresis, and long-term stability hamper performance. Microwave annealing (MWA) technology...

Full description

Bibliographic Details
Main Authors: Siwei Cui, Hui Yang, Yifei Zhang, Xing Su, Dongping Wu
Format: Article
Language:English
Published: MDPI AG 2023-09-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/14/10/1854
_version_ 1797572964416225280
author Siwei Cui
Hui Yang
Yifei Zhang
Xing Su
Dongping Wu
author_facet Siwei Cui
Hui Yang
Yifei Zhang
Xing Su
Dongping Wu
author_sort Siwei Cui
collection DOAJ
description Recently, certain challenges have persisted in PH sensor applications, especially when employing hafnium oxide (HfO<sub>2</sub>) thin films as sensing layers, where issues related to sensitivity, hysteresis, and long-term stability hamper performance. Microwave annealing (MWA) technology, as a promising solution for addressing these challenges, has gained significant attraction due to its unique advantages. In this article, the effects of microwave annealing (MWA) treatment on the sensing behaviors of Extended-Gate Field-Effect Transistors (EGFETs) utilizing HfO<sub>2</sub> as a sensing film have been investigated for the first time. Various power levels of MWA treatment (1750 W/2100 W/2450 W) were selected to explore the optimal processing conditions. A thorough physical analysis was conducted to characterize the surface of the MWA-treated HfO<sub>2</sub> sensing thin film using techniques such as X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Our findings reveal that MWA treatment effectively increased the surface sites (<i>Ns</i>) in the HfO<sub>2</sub> sensing thin film, consequently leading to an increase in the pH sensitivity of EGFETs to 59.6 mV/pH, as well as a reduction in hysteresis and an enhancement in long-term stability. These results suggest that MWA offers a straightforward, energy-efficient method to enhance overall HfO<sub>2</sub> sensing film performance in EGFETs, offering insights for HfO<sub>2</sub> applications and broader microelectronics challenges.
first_indexed 2024-03-10T21:02:59Z
format Article
id doaj.art-d1efacb620e04200b23d48ead13bd339
institution Directory Open Access Journal
issn 2072-666X
language English
last_indexed 2024-03-10T21:02:59Z
publishDate 2023-09-01
publisher MDPI AG
record_format Article
series Micromachines
spelling doaj.art-d1efacb620e04200b23d48ead13bd3392023-11-19T17:23:48ZengMDPI AGMicromachines2072-666X2023-09-011410185410.3390/mi14101854Effect of Microwave Annealing on the Sensing Characteristics of HfO<sub>2</sub> Thin Film for High Sensitive pH-EGFET SensorSiwei Cui0Hui Yang1Yifei Zhang2Xing Su3Dongping Wu4State Key Laboratory of ASIC and System, Fudan University, Shanghai 200433, ChinaInstitute of Photonic Chips, University of Shanghai for Science and Technology, Shanghai 200093, ChinaState Key Laboratory of ASIC and System, Fudan University, Shanghai 200433, ChinaState Key Laboratory of ASIC and System, Fudan University, Shanghai 200433, ChinaState Key Laboratory of ASIC and System, Fudan University, Shanghai 200433, ChinaRecently, certain challenges have persisted in PH sensor applications, especially when employing hafnium oxide (HfO<sub>2</sub>) thin films as sensing layers, where issues related to sensitivity, hysteresis, and long-term stability hamper performance. Microwave annealing (MWA) technology, as a promising solution for addressing these challenges, has gained significant attraction due to its unique advantages. In this article, the effects of microwave annealing (MWA) treatment on the sensing behaviors of Extended-Gate Field-Effect Transistors (EGFETs) utilizing HfO<sub>2</sub> as a sensing film have been investigated for the first time. Various power levels of MWA treatment (1750 W/2100 W/2450 W) were selected to explore the optimal processing conditions. A thorough physical analysis was conducted to characterize the surface of the MWA-treated HfO<sub>2</sub> sensing thin film using techniques such as X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Our findings reveal that MWA treatment effectively increased the surface sites (<i>Ns</i>) in the HfO<sub>2</sub> sensing thin film, consequently leading to an increase in the pH sensitivity of EGFETs to 59.6 mV/pH, as well as a reduction in hysteresis and an enhancement in long-term stability. These results suggest that MWA offers a straightforward, energy-efficient method to enhance overall HfO<sub>2</sub> sensing film performance in EGFETs, offering insights for HfO<sub>2</sub> applications and broader microelectronics challenges.https://www.mdpi.com/2072-666X/14/10/1854hafnium oxideEGFET pH sensormicrowave annealinghigh sensitivity
spellingShingle Siwei Cui
Hui Yang
Yifei Zhang
Xing Su
Dongping Wu
Effect of Microwave Annealing on the Sensing Characteristics of HfO<sub>2</sub> Thin Film for High Sensitive pH-EGFET Sensor
Micromachines
hafnium oxide
EGFET pH sensor
microwave annealing
high sensitivity
title Effect of Microwave Annealing on the Sensing Characteristics of HfO<sub>2</sub> Thin Film for High Sensitive pH-EGFET Sensor
title_full Effect of Microwave Annealing on the Sensing Characteristics of HfO<sub>2</sub> Thin Film for High Sensitive pH-EGFET Sensor
title_fullStr Effect of Microwave Annealing on the Sensing Characteristics of HfO<sub>2</sub> Thin Film for High Sensitive pH-EGFET Sensor
title_full_unstemmed Effect of Microwave Annealing on the Sensing Characteristics of HfO<sub>2</sub> Thin Film for High Sensitive pH-EGFET Sensor
title_short Effect of Microwave Annealing on the Sensing Characteristics of HfO<sub>2</sub> Thin Film for High Sensitive pH-EGFET Sensor
title_sort effect of microwave annealing on the sensing characteristics of hfo sub 2 sub thin film for high sensitive ph egfet sensor
topic hafnium oxide
EGFET pH sensor
microwave annealing
high sensitivity
url https://www.mdpi.com/2072-666X/14/10/1854
work_keys_str_mv AT siweicui effectofmicrowaveannealingonthesensingcharacteristicsofhfosub2subthinfilmforhighsensitivephegfetsensor
AT huiyang effectofmicrowaveannealingonthesensingcharacteristicsofhfosub2subthinfilmforhighsensitivephegfetsensor
AT yifeizhang effectofmicrowaveannealingonthesensingcharacteristicsofhfosub2subthinfilmforhighsensitivephegfetsensor
AT xingsu effectofmicrowaveannealingonthesensingcharacteristicsofhfosub2subthinfilmforhighsensitivephegfetsensor
AT dongpingwu effectofmicrowaveannealingonthesensingcharacteristicsofhfosub2subthinfilmforhighsensitivephegfetsensor