Fabrication of the X-Ray Mask using the Silicon Dry Etching
The X-ray lithography of uses synchrotron radiation is one of the microprocessing structure fabrication technology. In X-ray lithography, precision of the fabricated structure is influenced by precision of the X-ray mask considerably. Conventionally, the X-ray mask was fabricated with UV lithography...
Main Authors: | , , , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
The Japan Society of Mechanical Engineers
2008-04-01
|
Series: | Journal of Advanced Mechanical Design, Systems, and Manufacturing |
Subjects: | |
Online Access: | https://www.jstage.jst.go.jp/article/jamdsm/2/2/2_2_246/_pdf/-char/en |