Fabrication of the X-Ray Mask using the Silicon Dry Etching

The X-ray lithography of uses synchrotron radiation is one of the microprocessing structure fabrication technology. In X-ray lithography, precision of the fabricated structure is influenced by precision of the X-ray mask considerably. Conventionally, the X-ray mask was fabricated with UV lithography...

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Bibliographic Details
Main Authors: Hiroshi TSUJII, Kazuma SHIMADA, Makoto TANAKA, Wataru YASHIRO, Daiji NODA, Tadashi HATTORI
Format: Article
Language:English
Published: The Japan Society of Mechanical Engineers 2008-04-01
Series:Journal of Advanced Mechanical Design, Systems, and Manufacturing
Subjects:
Online Access:https://www.jstage.jst.go.jp/article/jamdsm/2/2/2_2_246/_pdf/-char/en